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Sep 1974

Volume 11, Issue 5, pp. 863-907


Ion etching of thin windows in silicon

E. G. Spencer, P. V. Lenzo, and P. H. Schmidt

J. Vac. Sci. Technol. 11, 863 (1974); http://dx.doi.org/10.1116/1.1318079 (2 pages)

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Ion etching is used to fabricate thin windows, 5–10 μ thick and ∼ 1-cm diam, in silicon wafers. The method involves a simple variation of a widely used ion source, and provides etch rates of ∼20 μ∕h over the 1-cm diam area. The surface of the window is flat and smooth, having a mirror-like finish. The edge of the window is sharp and is defined by the directionality of the ion beam. In this experimental arrangement, the material to be etched acts as a cathode; therefore the method is applicable to all electrically conductive materials.
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81.65.Cf Surface cleaning, etching, patterning

CNDO model and interpretation of the photoelectron spectrum of CO chemisorbed on Ni

G. Blyholder

J. Vac. Sci. Technol. 11, 865 (1974); http://dx.doi.org/10.1116/1.1318080 (4 pages) | Cited 15 times

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CNDO calculations for CO chemisorbed on a cluster of 10 Ni atoms produce a pattern of valence orbital energy levels that agrees well with the experimental photoelectron spectrum of CO adsorbed on Ni; thus allowing the experimental energies to be assigned to specific orbitals. The bonding of the carbon atom to the Ni atom largely involves nickel s and p orbitals, with little contribution from the d orbitals.
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79.60.Dp Adsorbed layers and thin films
73.20.Hb Impurity and defect levels; energy states of adsorbed species
68.43.-h Chemisorption/physisorption: adsorbates on surfaces

Structure and mechanical properties of thick Fe, Fe–NbC, Fe–Ni–NbC condensates

B. A. Movchan, A. V. Demchishin, and L. D. Kooluck

J. Vac. Sci. Technol. 11, 869 (1974); http://dx.doi.org/10.1116/1.1318081 (6 pages) | Cited 3 times

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Structure and mechanical properties of pure iron 0.8–2.0-mm thick condensates in tension are studied as a function of the substrate temperature within the range 270 °–860 °C. The mechanical properties of two-phase Fe–NbC condensates, containing up to 18% by volume niobium carbide were investigated at room temperature and 700 °C. The introduction of niobium carbide, having negligible solubility in iron, into the latter permits one to increase the tensile and yield strengths of condensates up to 90 and 86 kg∕mm2, respectively, at room temperature, and tensile and yield strengths of 45 and 36 kg∕mm2 at 700 °C with 13%–16% by volume NbC content. The effect of alloying the iron matrix with nickel in the amount of 18% by weight on the structure and mechanical properties in tension of Fe–Ni–NbC material was determined. The tensile and yield strengths of such materials reached 116 and 108 kg∕mm2, respectively, at 20 °C and 59 and 40 kg∕mm2 at 700 °C where the NbC content was approximately 9% by volume. An attempt was made to evaluate the increment of yield strength when introducing NbC-dispersed particles from the stand point of Orowan and Ansell–Lenel theories. It has been found that the contribution of the dispersed particles and solid solution into the condensate, strengthening at room temperature, is governed by the law of additivity.
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81.05.-t Specific materials: fabrication, treatment, testing, and analysis
81.15.Jj Ion and electron beam-assisted deposition; ion plating

A sputtering technique for coating the inside walls of through-holes in substrates

J. L. Vossen

J. Vac. Sci. Technol. 11, 875 (1974); http://dx.doi.org/10.1116/1.1318082 (3 pages) | Cited 6 times

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By sputter-etching a substrate with through-holes while the substrate rests on a sputtering target, material from the target coats the inside walls of the through-holes without appreciably coating the plane surfaces. The deposition rate is greatest when the sputtering voltage is low (<1 kV), and the pressure- and target-sputtering yield are high. The rate is nearly independent of the hole aspect ratio (ratio of diameter to depth) for ratios greater than 0.3, but decreases rapidly for smaller ratios. The uniformity of the films thus deposited depends mainly on the smoothness of the through-hole walls.
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81.15.Cd Deposition by sputtering

A magnetic sector atom-probe FIM

Erwin W. Müller and Toshio Sakurai

J. Vac. Sci. Technol. 11, 878 (1974); http://dx.doi.org/10.1116/1.1318083 (5 pages) | Cited 8 times

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The 60 ° magnetic sector atom-probe field ion microscope displays a section of the momentum spectrum on a stack of microchannel plates and a proximity-focused phosphor screen. A mass resolution ΔMM ∼ 1∕2000 is achieved, and “spectral lines” made up of a few individual ions may be used for the detection and identification of products of field evaporation of metals and their compounds with adsorbate gases. The capability of the new instrument is complementary to the established ToF atom probe as it employs very low evaporation rates in slow pulse or dc field evaporation, and displays the energy distribution of field ions. As an example of the difference, a palladium–neon ion compound PdNe+ is demonstrated to be very abundant, while it is a rare species in the ToF atom probe.
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07.78.+s Electron, positron, and ion microscopes; electron diffractometers
68.37.Vj Field emission and field-ion microscopy

Manganese sputter-etch masks for integrated optical circuits

W. M. Muska

J. Vac. Sci. Technol. 11, 883 (1974); http://dx.doi.org/10.1116/1.1318084 (2 pages)

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The fabrication of integrated optical circuits, such as directional couplers, requires dielectric patterns of high resolution and edge acuity. This paper describes the application of manganese sputter-etch masks to the fabrication of these circuits. It is shown that the physical properties of manganese are well suited to mask fabrication by the lift-off technique and that optical waveguides sputter etched from glass films using these masks meet the stringent edge-roughness requirements for low-loss guidance. Manganese masks may also be suitable for other applications where high resolution and edge acuity are important.
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42.82.Cr Fabrication techniques; lithography, pattern transfer

Analysis of thermal-desorption spectra using a computer graphics system

E. V. Kornelsen and D. H. O'Hara

J. Vac. Sci. Technol. 11, 885 (1974); http://dx.doi.org/10.1116/1.1318085 (4 pages)

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A computer graphics system has been programmed to allow experimental thermal-desorption spectra to be matched visually with the sum of up to twelve theoretical first-order desorption peaks. The system allows the resulting theoretical spectrum to be stored for later recovery or plotted along with the experimental spectrum using an X–Y plotter. The temperatures and amplitudes of the chosen theoretical peaks and the rms difference between the theoretical and experimental spectra are available for either display or printout. Analysis of a series of helium desorption spectra showed that peak temperatures could be determined to within ±0.8%, and that the main limitations were attributable to temperature uncertainties and noise in the experimental spectra.
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68.03.Fg Evaporation and condensation of liquids
68.43.Mn Adsorption kinetics
07.05.Rm Data presentation and visualization: algorithms and implementation

Porous leak evaluation and application to calibration of a high-pressure ion gauge

W. W. Hultzman and L. N. Krause

J. Vac. Sci. Technol. 11, 889 (1974); http://dx.doi.org/10.1116/1.1318086 (3 pages) | Cited 1 time

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Results are presented on the characteristics of a porous platinum leak, of about 10−8 liters∕sec nitrogen conductance, as the basic element for the control and measurement of gas flowrate into a vacuum gauge calibration system. The leak produced free-molecule type flow for supply pressures ranging from 8 to 800 Torr, and for ten different gases whose molecular weights ranged from 2 to 131. Leak conductances were determined to within a few percent limit of error by measuring the pressure rise in a known volume downstream of the leak. Since this pressure-rise method requires less than 10 min to perform, it can be done at any convenient time during a gauge calibration. Results are also presented on the relative sensitivity of a high-pressure ion gauge for ten gases at 10−4 Torr and on the gauge's nonlinearity (for N2) in the range 10−4 to 1 Torr.
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07.30.Dz Vacuum gauges

Effects of particles on high-voltage vacuum breakdown and interelectrode current

J. J. Maley

J. Vac. Sci. Technol. 11, 892 (1974); http://dx.doi.org/10.1116/1.1318087 (4 pages) | Cited 3 times

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Ten types of particles commonly found in electron tubes were tested for their effects on high-voltage breakdown and interelectrode current. The particles were applied to stainless steel electrodes and then tested for initial breakdown voltage, number of breakdowns necessary to condition the electrodes, and interelectrode current after high-voltage conditioning. It was found that insulating particles lower the breakdown voltage as much as 30% but the electrodes can be easily conditioned with little damage. Conducting particles and amorphous carbon particles lower the breakdown voltage up to 45%. In addition, these particles cause severe high-voltage conditioning problems. There is much more arcing during conditioning which results in severely damaged electrode surfaces. The arc craters are then a source of interelectrode leakage.
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84.47.+w Vacuum tubes

Evaporative segregation in 80% Ni–20% Cr and 60% Fe–40% Ni alloys

K. P. Gupta, J. L. Mukherjee, and C. H. Li

J. Vac. Sci. Technol. 11, 896 (1974); http://dx.doi.org/10.1116/1.1318088 (3 pages)

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An analytical approach is outlined to calculate the evaporative segregation behavior in metallic alloys. The theoretical predictions are based on a “normal” evaporation model and have been examined for Fe–Ni and Ni–Cr alloys. A fairly good agreement has been found between the predicted values and the experimental results found in the literature.
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64.75.-g Phase equilibria
64.70.Hz Solid-vapor transitions
81.15.-z Methods of deposition of films and coatings; film growth and epitaxy

Effect of annealing on the surface composition of stainless steel 410

S. V. Krishnaswamy, S. B. McLane, and E. W. Müller

J. Vac. Sci. Technol. 11, 899 (1974); http://dx.doi.org/10.1116/1.1318089 (4 pages) | Cited 2 times

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Atom-probe analysis shows the depletion of chromium from the surface of stainless steel 410 tips subjected to heating in vacuum. Times necessary for depletion are lower by a factor of 104 than those found by Park et al. in which planar surfaces were analyzed by the x-ray appearance potential technique. This is explained on the basis of the great sensitivity of depletion rate upon the surface-to-volume ratio. The atom-probe specimens have a surface-to-volume ratio similar to catalytic powders, and thus the results of preferential evaporation, may be more realistic for the study of powder catalysts which are subject to annealing. The present work also cautions atom-probe experimenters in drawing conclusions from the abundance of atomic species after an alloy tip has been annealed in vacuum.
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81.40.Ef Cold working, work hardening; annealing, post-deformation annealing, quenching, tempering recovery, and crystallization
68.35.Dv Composition, segregation; defects and impurities
81.05.Bx Metals, semimetals, and alloys

The effects of oxygen adsorption on the positive secondary ion yield of stainless steel

Rudolf Schubert

J. Vac. Sci. Technol. 11, 903 (1974); http://dx.doi.org/10.1116/1.1318090 (3 pages) | Cited 3 times

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The positive secondary ion yields of Fe and Cr in 301 stainless steel vs oxygen exposure are studied using secondary ion mass spectrometry. It is shown that there are large amounts of Fe in the surface layer, although it is enriched with Cr. Both elements readily and reversibly form surface oxides. Furthermore, it is shown that the absolute elemental yields cannot be used to calculate alloy compositions at the present time.
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68.35.Dv Composition, segregation; defects and impurities
68.03.Fg Evaporation and condensation of liquids
68.43.Mn Adsorption kinetics
82.80.Ms Mass spectrometry (including SIMS, multiphoton ionization and resonance ionization mass spectrometry, MALDI)

Substrate heater for bias sputtering and ion plating applications

R. D. Bland

J. Vac. Sci. Technol. 11, 906 (1974); http://dx.doi.org/10.1116/1.1318091 (2 pages)

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Abstract Unavailable
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07.20.Hy Furnaces; heaters
81.15.-z Methods of deposition of films and coatings; film growth and epitaxy
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