Photodeposition of metal films with ultraviolet laser light

Ehrlich, D. J.; Osgood, R. M.; Deutsch, T. F.

doi:doi:10.1116/1.571724

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Journal of Vacuum Science & Technology Archives 1964-1982 / Volume 21 / Issue 1

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J. Vac. Sci. Technol. 21, 23 (1982); http://dx.doi.org/10.1116/1.571724 (10 pages)

Photodeposition of metal films with ultraviolet laser light

D. J. Ehrlich, R. M. Osgood, and T. F. Deutsch

Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173

Abstract

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A technique for maskless writing of metal films with submicrometer dimensions is described. An ultraviolet beam from a cw or pulsed laser is used to photodissociate an organometallic gas near a gas–solid interface. The liberated metal atoms then condense in an area of dimensions comparable to the laser spot size. Experiments which elucidate the essential physics of the process have been performed.