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Nov 2000

Volume 18, Issue 6, pp. 2619-3013

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Erratum: “Effects of BCl3 addition on Ar/Cl2 gas in inductively coupled plasmas for lead zirconate titanate etching” [J. Vac. Sci. Technol. A 18, 1373 (2000)]

Tae-Hyun An, Joon-Yong Park, Geun-Young Yeom, Eui-Goo Chang, and Chang-Il Kim

J. Vac. Sci. Technol. A 18, 3012 (2000); http://dx.doi.org/10.1116/1.1319316 (2 pages)

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© 2000 American Vacuum Society.
Show PACS
52.77.Bn Etching and cleaning
52.77.Dq Plasma-based ion implantation and deposition
77.84.Ek Niobates and tantalates
77.84.Cg PZT ceramics and other titanates
77.55.-g Dielectric thin films
81.65.Cf Surface cleaning, etching, patterning
52.70.Kz Optical (ultraviolet, visible, infrared) measurements
99.10.Cd Errata
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