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Jan 2004

Volume 22, Issue 1, pp. 1-224

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Ion doses for low-energy ion-assist applications

H. R. Kaufman and J. M. E. Harper

J. Vac. Sci. Technol. A 22, 221 (2004); http://dx.doi.org/10.1116/1.1633565 (4 pages) | Cited 8 times

Online Publication Date: 8 January 2004

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We present simple, convenient procedures for calculating ion doses for ion-assist applications such as cleaning and property modification. For many of these applications, gridless ion sources of the end-Hall type are particularly well-suited to the generation of high ion-beam currents at ion energies low enough to minimize damage. © 2004 American Vacuum Society.
Show PACS
07.77.Ka Charged-particle beam sources and detectors
81.15.Jj Ion and electron beam-assisted deposition; ion plating
81.65.Cf Surface cleaning, etching, patterning
79.20.Rf Atomic, molecular, and ion beam impact and interactions with surfaces
29.25.Ni Ion sources: positive and negative
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