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Sep 2004

Volume 22, Issue 5, pp. L7-2215

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Radio frequency line-plasma source using permanent magnets

Youichi Sakawa, Kentaro Yano, and Tatsuo Shoji

J. Vac. Sci. Technol. A 22, L7 (2004); http://dx.doi.org/10.1116/1.1786594 (4 pages) | Cited 3 times

Online Publication Date: 24 September 2004

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Show Abstract
A high-density and uniform line-plasma source is developed by an inductive rf discharge using a rectangular discharge chamber (200×100×20 mm) with a pair of permanent magnets placed on top and bottom of the chamber. Ion-saturation current-density Jis profile is controlled by varying the width of the magnets and the distance between the antenna and the magnets. A 140-mm-wide plasma [plasma density ≃ (1.8-2.5)×1012 cm−3 for electron temperature = 4–8 eV] of a uniformity variation within 90% is produced using a 140-mm-long antenna for an Ar pressure of 20 mTorr and a rf power of 3 kW. The measured Jis profiles are explained by solving the equation of motion for electrons under a magnetic field structure of longitudinal line cusps.
Show PACS
52.50.Dg Plasma sources
52.25.-b Plasma properties
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