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J. Vac. Sci. Technol. A 24, 978 (2006); http://dx.doi.org/10.1116/1.2204926 (10 pages)

Direct observations of rapid diffusion of Cu in Au thin films using in situ x-ray diffraction

J. W. Elmer1, T. A. Palmer1, and E. D. Specht2

1Lawrence Livermore National Laboratory, Livermore, California 94551
2Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831

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(Published online 22 May 2006)

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In situ x-ray diffraction was performed while annealing thin film Au/Cu binary diffusion couples to directly observe diffusion at elevated temperatures. The temperature dependence of the interdiffusion coefficient was determined from isothermal measurements at 700, 800, and 900 °C, where Cu and Au form a disordered continuous face centered cubic solid solution. Large differences in the lattice parameters of Au and Cu allowed the initial diffraction peaks to be easily identified, and later tracked as they merged into one diffraction peak with increased diffusion time. Initial diffusion kinetics were studied by measuring the time required for the Cu to diffuse through the Au thin film of known thickness. The activation energy for interdiffusion was measured to be 65.4 kJ/mole during this initial stage, which is approximately 0.4× that for bulk diffusion and 0.8× that for grain boundary diffusion. The low activation energy is attributed to the high density of columnar grain boundaries combined with other defects in the sputter deposited thin film coatings. As interdiffusion continues, the two layers homogenize with an activation energy of 111 kJ/mole during the latter stages of diffusion. This higher activation energy falls between the reported values for grain boundary and bulk diffusion, and may be related to grain growth occurring at these temperatures which accounts for the decreasing importance of grain boundaries on diffusion.

© 2006 American Vacuum Society

ACKNOWLEDGMENTS

This work was performed under the auspices of the U.S. Department of Energy, Lawrence Livermore National Laboratory, under Contract No. W-7405-ENG-48. Part of the research was sponsored by the U.S. Department of Energy Division of Materials Sciences and Engineering under contract No. DE-AC05-00OR22725 with UT-Battelle, LLC. The UNICAT facility at the Advanced Photon Source (APS) is supported by the U.S. DOE under Award No. DEFG02-91ER45439, through the Frederick Seitz Materials Research Laboratory at the University of Illinois at Urbana-Champaign, the Oak Ridge National Laboratory (U.S. DOE Contract No. DE-AC05-00OR22725 with UT-Battelle LLC), the National Institute of Standards and Technology (U.S. Department of Commerce) and UOP LLC. The APS is supported by the U.S. DOE, Basic Energy Sciences, Office of Science under Contract No. W-31-109-ENG-38. The authors express gratitude to Ron Forman of LLNL for preparing the PVD coatings and Edwin Sedillo of LLNL for performing scanning electron microscopy.

Article Outline

  1. INTRODUCTION
  2. EXPERIMENTAL PROCEDURES
    1. Sample preparation
    2. In situ x-ray diffraction experiments
  3. RESULTS
    1. General observations and initial sample condition
    2. Elevated temperature experiments
  4. DISCUSSION
    1. Initial stages of interdiffusion
    2. Later stages of diffusion
    3. Characterization of the films
  5. CONCLUSIONS

KEYWORDS and PACS

PACS

  • 66.30.Ny

    Chemical interdiffusion; diffusion barriers

  • 68.35.Fx

    Diffusion; interface formation

  • 61.72.Mm

    Grain and twin boundaries

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0734-2101 (print)  

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