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Sep 2006

Volume 24, Issue 5, pp. L7-1972

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Design of a hydrogen etching system for surface preparation of SiC wafers

D. J. Rearick, O. Maksimov, and V. D. Heydemann

J. Vac. Sci. Technol. A 24, 1970 (2006); http://dx.doi.org/10.1116/1.2244538 (2 pages)

Online Publication Date: 6 September 2006

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81.05.Hd	Other semiconductors
81.65.Cf	Surface cleaning, etching, patterning
81.65.Ps	Polishing, grinding, surface finishing

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Sep 2006

Volume 24, Issue 5, pp. L7-1972

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