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Journal of Vacuum Science & Technology A / Volume 28 / Issue 4 / PAPERS FROM THE 56TH INTERNATIONAL SYMPOSIUM OF AVS / Advanced Surface Engineering/Thin Film

J. Vac. Sci. Technol. A 28, 1002 (2010); http://dx.doi.org/10.1116/1.3447231 (8 pages)

Influence of substrate temperature on glancing angle deposited Ag nanorods

C. Khare1, C. Patzig1, J. W. Gerlach1, B. Rauschenbach1, and B. Fuhrmann2

1Leibniz Institute of Surface Modification, Permoserstraße 15, 04318 Leipzig, Germany
2Interdisciplinary Centre of Materials Science, Martin-Luther-University Halle, Heinrich-Damerow-Straße 4, 06120 Halle, Germany

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(Published online 29 June 2010)

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When Ag sculptured thin films were grown with glancing angle deposition by ion beam sputtering at either room temperature or elevated substrate temperatures TS, a large morphological difference was observed. The incident particle flux reached the silicon substrate at a glancing angle β ≥ 80° as measured to the substrate normal. A slit aperture was used in order to reduce the particle beam divergence. At room temperature, columnar structures were formed, irrespective of the presence of the slit aperture. At elevated temperatures (573 and 623 K) and collimated particle flux in the presence of the slit aperture, however, enhanced surface diffusion causes the growth of crystalline nanorod- and nanowirelike structures. In the absence of the slit aperture, the flux beam divergence is higher, resulting in island- and mountainlike crystalline structures. The density of the nanorods and nanowires was observed to be higher on the planar Si substrates in comparison to honeycomblike prepatterned substrates with different pattern periods. On the patterned substrates, the nanorods are not necessarily found to be evolving on the seed points but can rather be also observed in-between the artificial seeds. The glancing angle deposited films at high temperatures were observed to be polycrystalline, where the (111) crystal orientation of the film is dominant, while the presence of the less intense (200) reflection was noticed from the x-ray diffraction measurements. In contrast, compact thin films deposited with β ≈ 0° at high temperatures were found to be epitaxial with (200) orientation.

© 2010 American Vacuum Society

ACKNOWLEDGMENTS

We would like to thank Professor Dr. Thomas Höche for performing TEM on the samples. This work is supported by the Graduate school “BuildMoNa” (University of Leipzig, Germany) funded within the German Excellence Initiative.

Article Outline

  1. INTRODUCTION
  2. EXPERIMENT
  3. RESULTS AND DISCUSSION
    1. Ag nanostructure growth on different substrates
    2. Effect of flux collimation on the film morphology
    3. Nanorod growth on prepatterned substrates
    4. Nanorod characterization by XRD and TEM measurements
  4. CONCLUSION

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KEYWORDS and PACS

Keywords

crystal orientation, metallic thin films, nanofabrication, nanorods, nanowires, silver, sputter deposition, surface diffusion, X-ray diffraction, silver, silicon

PACS

  • 81.16.-c

    Methods of micro- and nanofabrication and processing

  • 81.15.Cd

    Deposition by sputtering

  • 61.46.Km

    Structure of nanowires and nanorods (long, free or loosely attached, quantum wires and quantum rods, but not gate-isolated embedded quantum wires)

  • 81.07.Gf

    Nanowires

  • 68.35.Fx

    Diffusion; interface formation

  • 68.55.-a

    Thin film structure and morphology

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History
Received 23 September 2009
Accepted 17 May 2010
Published online 29 June 2010
Digital Object Identifier
http://dx.doi.org/10.1116/1.3447231

PUBLICATION DATA

ISSN

0734-2101 (print)  
1520-8559 (online)

Publisher

American Vacuum Society

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