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Jul 2010

Volume 28, Issue 4, pp. L5-1028

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J. Vac. Sci. Technol. A 28, 1010 (2010); http://dx.doi.org/10.1116/1.3271148 (8 pages)

A. Michalkova and J. Leszczynski
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back to top Advanced Surface Engineering/Thin Film

Deposited nanorod films for photonic crystal biosensor applications

Wei Zhang, Seok-min Kim, Nikhil Ganesh, Ian D. Block, Patrick C. Mathias, Hsin-Yu Wu, and Brian T. Cunningham

J. Vac. Sci. Technol. A 28, 996 (2010); http://dx.doi.org/10.1116/1.3429595 (6 pages) | Cited 1 time

Online Publication Date: 29 June 2010

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Planar photonic crystals have been used as the basis of many biological sensing devices. Here, the authors successfully demonstrated that the combination of the photonic crystal structures and a dielectric nanorod coating prepared by the glancing-angle deposition technique can lead to significant increases in the device sensitivity. By incorporating a TiO2 nanorod coating onto the label-free photonic crystal biosensor structure, the surface area of the device is increased. The results for detection of polymer films and proteins indicate up to a 5.5 fold enhancement of detected adsorbed mass density.
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87.85.-d Biomedical engineering
87.85.Rs Nanotechnologies-applications
81.07.Bc Nanocrystalline materials
78.67.Pt Multilayers; superlattices; photonic structures; metamaterials

Influence of substrate temperature on glancing angle deposited Ag nanorods

C. Khare, C. Patzig, J. W. Gerlach, B. Rauschenbach, and B. Fuhrmann

J. Vac. Sci. Technol. A 28, 1002 (2010); http://dx.doi.org/10.1116/1.3447231 (8 pages) | Cited 13 times

Online Publication Date: 29 June 2010

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When Ag sculptured thin films were grown with glancing angle deposition by ion beam sputtering at either room temperature or elevated substrate temperatures TS, a large morphological difference was observed. The incident particle flux reached the silicon substrate at a glancing angle β ≥ 80° as measured to the substrate normal. A slit aperture was used in order to reduce the particle beam divergence. At room temperature, columnar structures were formed, irrespective of the presence of the slit aperture. At elevated temperatures (573 and 623 K) and collimated particle flux in the presence of the slit aperture, however, enhanced surface diffusion causes the growth of crystalline nanorod- and nanowirelike structures. In the absence of the slit aperture, the flux beam divergence is higher, resulting in island- and mountainlike crystalline structures. The density of the nanorods and nanowires was observed to be higher on the planar Si substrates in comparison to honeycomblike prepatterned substrates with different pattern periods. On the patterned substrates, the nanorods are not necessarily found to be evolving on the seed points but can rather be also observed in-between the artificial seeds. The glancing angle deposited films at high temperatures were observed to be polycrystalline, where the (111) crystal orientation of the film is dominant, while the presence of the less intense (200) reflection was noticed from the x-ray diffraction measurements. In contrast, compact thin films deposited with β ≈ 0° at high temperatures were found to be epitaxial with (200) orientation.
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81.16.-c Methods of micro- and nanofabrication and processing
81.15.Cd Deposition by sputtering
61.46.Km Structure of nanowires and nanorods (long, free or loosely attached, quantum wires and quantum rods, but not gate-isolated embedded quantum wires)
81.07.Gf Nanowires
68.35.Fx Diffusion; interface formation
68.55.-a Thin film structure and morphology
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