Electrodeposition of cobalt nanowires on H-terminated conductive Si(111) surfaces using coblock polymer templating

Curry, Michael L.; Crews, Kristy; Warke, Vishal; Bakker, Martin Gerard; Hong, Kunlun; Mays, Jimmy; Britt, Phillip; Li, Xuefa; Wang, Jin

doi:doi:10.1116/1.3563604

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Journal of Vacuum Science & Technology A / Volume 29 / Issue 3 / Surfaces

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J. Vac. Sci. Technol. A 29, 031401 (2011); http://dx.doi.org/10.1116/1.3563604 (5 pages)

Electrodeposition of cobalt nanowires on H-terminated conductive Si(111) surfaces using coblock polymer templating

Michael L. Curry¹, Kristy Crews², Vishal Warke³, Martin Gerard Bakker³, Kunlun Hong⁴, Jimmy Mays⁴, Phillip Britt⁴, Xuefa Li⁵, and Jin Wang⁵

¹Center for Materials for Information Technology, The University of Alabama, Tuscaloosa, Alabama 35487 and Department of Chemistry, Tuskegee University, Tuskegee, Alabama 36008
²Department of Chemistry, The University of West Alabama, Livingston, Alabama 35470
³Center for Materials for Information Technology, The University of Alabama, Tuscaloosa, Alabama 35487 and Department of Chemistry, The University of Alabama, Box 870336, Tuscaloosa, Alabama 35487-0336
⁴Center for Nanophase Materials Science, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
⁵Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439

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(Published online 16 March 2011)

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The authors have investigated the formation of block copolymer nanocavities on H-terminated conducting Si(111) surfaces as templates for the electrochemical growth of perpendicular metallic nanowire arrays. Poly(styrene)-block-poly(methyl methacrylate) block copolymers (PS-b-PMMA) of appropriate block length and PS to PMMA ratio were used to create a self-assembled array of perpendicular nanocavities in which the PS majority phase is continuous and surrounds cylinders of the minority PMMA phase. Here, we report that H-terminated conducting Si(111) surfaces are also capable of inducing a perpendicular orientation in block copolymers, which—in all likelihood—is a direct result of the H-termination (i.e., removal of the oxide layer). Atomic force microscopy reveals that an acetic acid wash of the annealed block copolymer causes the minority PMMA component to be rearranged, giving rise to cavities that are perpendicular to the conducting Si substrate. Subsequently, scanning electron microscopy reveals that electrodeposition into the nanocavities can be achieved, producing an array of metallic nanopillars, 20 nm in diameter.

ACKNOWLEDGMENTS

The authors would like to acknowledge a grant from the Center for Nanophase Materials Science for synthesis of the block copolymers. The use of the Advanced Photon Source was supported by the U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences under Contract No. DE-AC02-06CH11357. Primary support of this work by INSIC’s Center for Materials for Information Technology at The University of Alabama is gratefully acknowledged. Some materials support from the MSREC (NSF Grant No. DMR-0213985) is also acknowledged.

Article Outline

INTRODUCTION
EXPERIMENT
1. Substrate pretreatment and preparation
2. Block copolymer thin film
3. Pattern formation and characterization
RESULTS AND DISCUSSION
CONCLUSION

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KEYWORDS and PACS

Keywords

atomic force microscopy, cobalt, electrodeposition, nanowires, polymer blends, scanning electron microscopy, silicon

PACS

81.07.Gf

Nanowires
81.05.Lg

Polymers and plastics; rubber; synthetic and natural fibers; organometallic and organic materials
81.15.Pq

Electrodeposition, electroplating
61.46.Km

Structure of nanowires and nanorods (long, free or loosely attached, quantum wires and quantum rods, but not gate-isolated embedded quantum wires)

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History

Received 1 November 2010
Accepted 13 February 2011
Published online 16 March 2011

Digital Object Identifier

http://dx.doi.org/10.1116/1.3563604

PUBLICATION DATA

ISSN

0734-2101 (print)

1520-8559 (online)

Publisher

American Vacuum Society

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