High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films

Dickey, Eric; Barrow, William A.

doi:doi:10.1116/1.3678486

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Journal of Vacuum Science & Technology A / Volume 30 / Issue 2 / Thin Films

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J. Vac. Sci. Technol. A 30, 021502 (2012); http://dx.doi.org/10.1116/1.3678486 (5 pages)

High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films

Eric Dickey and William A. Barrow

Lotus Applied Technology, 1050 NW Compton Drive, Hillsboro, Oregon, 97006

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(Published online 24 January 2012)

Abstract

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Atomic layer deposition has been shown to provide high quality single layer moisture barrier films on polymer substrates, but conventional pulse-based processes are too slow to be commercially feasible. One way to overcome this speed limitation is to avoid the need to pulse and purge precursors by moving the substrate between zones containing the precursors, passing through intermediate purge zones. Recently, several groups have reported various approaches to accomplishing this, including the approach discussed here in which the flexible web is passed between precursor zones in a serpentine pattern. Al₂O₃ and TiO₂ barrier films 12 to 20 nm thick with water vapor transmission rates in the range of 10⁻⁴ g/m²/day have been demonstrated for web speeds in excess of 1 m/s on 100 mm wide polyethylene terephthalate web. Scale-up of this process to 300 mm wide web in a system capable of depositing 10–20 nm of film in a single pass is currently under way. This scale-up effort and the potential for very high volume, low cost moisture barrier production utilizing this technique are discussed.

Article Outline

INTRODUCTION
EQUIPMENT CONFIGURATION
METAL OXIDE FILMS
1. Water-based thermal ALD processes
2. Plasma-based ALD processes
BARRIER LAYERS ON POLYMER SUBSTRATES
OUTLOOK
1. Scaling challenges
2. Potential
SUMMARY AND CONCLUSIONS

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KEYWORDS and PACS

Keywords

atomic layer deposition, moisture, polymer films, substrates

PACS

68.55.A-

Nucleation and growth
68.55.am

Polymers and organics
61.41.+e

Polymers, elastomers, and plastics
81.15.Gh

Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)

History

Received 9 September 2011
Accepted 30 December 2011
Published online 24 January 2012

Digital Object Identifier

http://dx.doi.org/10.1116/1.3678486

PUBLICATION DATA

ISSN

0734-2101 (print)

1520-8559 (online)

Publisher

American Vacuum Society

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