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Journal of Vacuum Science & Technology A / Volume 30 / Issue 2 / Thin Films

J. Vac. Sci. Technol. A 30, 021507 (2012); http://dx.doi.org/10.1116/1.3687204 (6 pages)

Metal oxide morphology in argon-assisted glancing angle deposition

J. B. Sorge1, M. T. Taschuk1, N. G. Wakefield1, J. C. Sit1, and M. J. Brett2

1Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB T6G 2V4, Canada
2Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB T6G 2V4, Canada and NRC National Institute for Nanotechnology, Edmonton, AB T6G 2M9, Canada

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(Published online 22 February 2012)

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Glancing angle deposition (GLAD) is a thin film deposition technique capable of fabricating columnar architectures such as posts, helices, and chevrons with control over nanoscale film features. Argon bombardment during deposition modifies the GLAD process, producing films with new morphologies which have shown promise for sensing and photonic devices. The authors report modification of column tilt angle, film density, and specific surface area for 12 different metal oxide and fluoride film materials deposited using Ar-assisted GLAD. For the vapor flux/ion beam geometry and materials studied here, with increasing argon flux, the column tilt increases, film density increases, and specific surface area decreases. With a better understanding of the nature of property modification and the mechanisms responsible, the Ar-assisted deposition process can be more effectively targeted towards specific applications, including birefringent thin films or photonic crystal square spirals.

© 2012 American Vacuum Society

ACKNOWLEDGMENTS

The authors acknowledge the financial support of the Natural Sciences and Engineering Research Council of Canada, Alberta Innovates–Technology Futures, and Micralyne, Inc. The authors would also like to thank George Braybrook for the SEM imaging.

Article Outline

  1. INTRODUCTION
  2. EXPERIMENTAL DETAILS
    1. Ar-assisted GLAD
    2. Film fabrication
    3. Surface area measurement
    4. Optical index and crystal phase characterization
  3. EXPERIMENTAL RESULTS
  4. DISCUSSION
  5. CONCLUSION

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KEYWORDS, PACS, and IPC

Keywords

electron beam deposition, ion beam assisted deposition, thin films

PACS

  • 68.55.J-

    Morphology of films

  • 81.15.Jj

    Ion and electron beam-assisted deposition; ion plating

International Patent Classification (IPC)

  • C23C14/46

    By ion beam produced by an external ion source

  • C23C16/48

    By irradiation, e.g. photolysis, radiolysis, particle radiation

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History
Received 20 December 2011
Accepted 1 February 2012
Published online 22 February 2012
Digital Object Identifier
http://dx.doi.org/10.1116/1.3687204

PUBLICATION DATA

ISSN

0734-2101 (print)  
1520-8559 (online)

Publisher

American Vacuum Society

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