Fabrication and performance of graphene nanoelectromechanical systems

Robert A. Barton, Jeevak Parpia, and Harold G. Craighead

J. Vac. Sci. Technol. B 29, 050801 (2011)
doi:10.1116/1.3623419

As a result of the recent progress in fabricating large-area graphene sheets, graphene-based mechanical devices have become vastly easier to manufacture and now show even greater promise for a range of applications. This article reviews the progress of resonant graphene nanoelectromechanical systems and the possible applications of this technology to signal processing, sensing, and other areas. After discussing recent advances in fabrication and measurement techniques that make graphene resonators a viable technology, the article presents what is known about the performance of graphene mechanical systems. The authors also highlight unresolved questions, such as the source of the dissipation in graphene resonators, and discuss the progress made on these issues to date. The authors conclude with a discussion of important future directions for graphene research and the applications for which graphene nanomechanical devices may be well suited. Read More

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Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication

Gottlieb S. Oehrlein, Raymond J. Phaneuf, and David B. Graves

J. Vac. Sci. Technol. B 29, 010801 (2011)
doi:10.1116/1.3532949

Advanced lithographic patterning of organic resist images followed by the transfer of resist patterns using plasma etching techniques into semiconducting, dielectric, conductive materials or matter with other functionalities/properties are the basis of the information technology, microsystems, and other current or developing technologies. One of the least understood elements of this approach is the interaction of the plasma species with the organic molecules representing the image, and the chemical, morphological and topographic changes induced by these interactions in the macromolecules themselves and the macromolecule defined nanoscale features. In this review the authors examine published observations and the scientific understanding that is available on factors that control etching resistance and dimensional stability of resist templates in plasma etching environments. Both materials parameters, e.g. polymer structure and composition, and plasma properties, e.g. role of ions, plasma-generated UV radiation, neutrals and energy deposition are considered. Resist template deformations seen after plasma processing such as surface and line edge roughness are related to experimental and computational studies of plasma or beam induced surface and near-surface modifications of model resists and polymers.

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To charge or not to charge: 50 years of lithographic choices

R. Fabian Pease

J. Vac. Sci. Technol. B 28, C6A1 (2010);
doi:10.1116/1.3517607

Lithography is one of those technologies that quietly enabled the technological transformations of the last fifty years. If you are holding an electronic gadget, the probability is nearly 100% that lithography was used in making one or more components inside it. Many people have heard of Moore’s law but few know that lithography together with plasma etching has led the charge. For the last three decades, the leading research in these fields has been published in JVST A & B. In the Nov/Dec issue of JVST B Fabian Pease looks back and then forward to make us think about the challenges and changes awaiting the field of lithography: F. Pease, “To charge or not to charge: 50 years of lithographic choices.

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