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Journal of Vacuum Science & Technology B / Volume 14 / Issue 6

J. Vac. Sci. Technol. B 14, 4129 (1996); http://dx.doi.org/10.1116/1.588605 (5 pages)

Nanoimprint lithography

Stephen Y. Chou, Peter R. Krauss, and Preston J. Renstrom

NanoStructure Laboratory, Department of Electrical Engineering, University of Minnesota, Minneapolis, Minnesota 55455

Nanoimprint lithography, a high‐throughput, low‐cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated further. Nanoimprint lithography has demonstrated 25 nm feature size, 70 nm pitch, vertical and smooth sidewalls, and nearly 90° corners. Further experimental study indicates that the ultimate resolution of nanoimprint lithography could be sub‐10 nm, the imprint process is repeatable, and the mold is durable. In addition, uniformity over a 15 mm by 18 mm area was demonstrated and the uniformity area can be much larger if a better designed press is used. Nanoimprint lithography over a nonflat surface has also been achieved. Finally, nanoimprint lithography has been successfully used for fabricating nanoscale photodetectors, silicon quantum‐dot, quantum‐wire, and ring transistors. © 1996 American Vacuum Society

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KEYWORDS and PACS

Keywords

NANOSTRUCTURES, LITHOGRAPHY, PHOTODETECTORS, TRANSISTORS, PHOTORESISTS, HEATING, GLASS TRANSFORMATIONS, MOLDING, SILICON, SILICON OXIDES, PRESSURE DEPENDENCE, MEDIUM PRESSURE, TEMPERATURE DEPENDENCE, TEMPERATURE RANGE 400−1000 K, SPATIAL RESOLUTION

PACS

  • 81.07.-b

    Nanoscale materials and structures: fabrication and characterization

  • 81.16.-c

    Methods of micro- and nanofabrication and processing

  • 85.35.-p

    Nanoelectronic devices

  • 85.35.Be

    Quantum well devices (quantum dots, quantum wires, etc.)

  • 85.60.Gz

    Photodetectors (including infrared and CCD detectors)

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History
Received 20 June 1996
Accepted 17 August 1996
Digital Object Identifier
http://dx.doi.org/10.1116/1.588605

PUBLICATION DATA

ISSN

0734-211X (print)  

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