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J. Vac. Sci. Technol. B 18, 3572 (2000); http://dx.doi.org/10.1116/1.1324618 (6 pages)
Step and flash imprint lithography: Template surface treatment and defect analysis
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Add to FacebookWe have finished the construction of an automated tool for step and flash imprint lithography. The tool was constructed to allow defect studies by making multiple imprints on a 200 mm wafer. The imprint templates for this study were treated with a low surface energy, self-assembled monolayer to ensure selective release at the template-etch barrier interface. This surface treatment is very durable and survives repeated imprints and multiple aggressive physical and chemical cleanings. The imprint and release forces were measured for a number of successive imprints, and did not change significantly. The process appears to be “self-cleaning.” Contamination on the template is entrained in the polymerizing liquid, and the number of defects is reduced with repeated imprints. © 2000 American Vacuum Society.
© 2000 American Vacuum Society
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Received 1 June 2000
Accepted 14 September 2000
Accepted 14 September 2000
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