Degradation of superhard nanocomposites by built-in impurities

Veprek, S.; Männling, H.-D.; Niederhofer, A.; Ma, D.; Mukherjee, S.

doi:doi:10.1116/1.1689305

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Journal of Vacuum Science & Technology B / Volume 22 / Issue 2 / LETTERS

J. Vac. Sci. Technol. B 22, L5 (2004); http://dx.doi.org/10.1116/1.1689305 (5 pages)

Degradation of superhard nanocomposites by built-in impurities

S. Veprek, H.-D. Männling, A. Niederhofer, D. Ma, and S. Mukherjee

Institute for Chemistry of Inorganic Materials, Technical University Munich, Lichtenbergstr. 4, D-85747 Garching b. Munich, Germany

(Published online 24 March 2004)

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Impurities such as oxygen and chlorine can strongly decrease the hardness of superhard nc-TiN/a-Si₃N₄ and similar nanocomposites when incorporated into the coatings during their deposition. It is shown that 1–1.5 at. % of oxygen causes a hardness decrease to about 30 GPa, as compared to 45–55 GPa for the pure material. This may explain some of the contradictory results found by other authors, particularly for coatings deposited by physical vapor deposition at relatively low nitrogen pressure, deposition temperature, and deposition rates. © 2004 American Vacuum Society.

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KEYWORDS and PACS

Keywords

titanium compounds, silicon compounds, plasma CVD coatings, impurities, oxygen, chlorine, hardness, nanocomposites, amorphous state, noncrystalline structure

PACS

81.65.-b

Surface treatments
61.46.-w

Structure of nanoscale materials
61.43.Er

Other amorphous solids
62.20.Qp

Friction, tribology, and hardness
68.35.Gy

Mechanical properties; surface strains
81.40.Np

Fatigue, corrosion fatigue, embrittlement, cracking, fracture, and failure
68.55.Ln

Defects and impurities: doping, implantation, distribution, concentration, etc.
81.15.Gh

Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)