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J. Vac. Sci. Technol. B 22, 3260 (2004); http://dx.doi.org/10.1116/1.1809614 (5 pages)

High fidelity blazed grating replication using nanoimprint lithography

Chih-Hao Chang1, J. C. Montoya1, M. Akilian1, A. Lapsa1, R. K. Heilmann1, M. L. Schattenburg1, M. Li2, K. A. Flanagan3, A. P. Rasmussen4, J. F. Seely5, J. M. Laming5, B. Kjornrattanawanich6, and L. I. Goray7

1Space Nanotechnology Laboratory, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
2Nanonex Corporation, 1 Deer Park Drive, Suite O, Monmouth Junction, New Jersey 08852
3Center for Space Research, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
4Columbia Astrophysics Lab, 550 West 120th Street, New York, New York 10027
5Naval Research Laboratory, Space Science Division, Washington, DC 20375
6Universities Space Research Association, Brookhaven National Laboratory, Upton, New York 11973
7International Intellectual Group, Inc., Penfield, New York 14526

(Published online 13 December 2004)

We report progress in using nanoimprint lithography to fabricate high fidelity blazed diffraction gratings. Anisotropically etched silicon gratings with 200 nm period and 7.5° blaze angle were successfully replicated onto 100 mm diameter wafers with subnanometer roughness and excellent profile conformity. Out-of-plane distortion induced by residual stress from polymer films was also analyzed and found to be extremely low. The replicated blazed gratings were tested and demonstrated high x-ray diffraction efficiencies. This process was developed for fabricating blazed diffraction gratings for the NASA Constellation-X x-ray telescope.

© 2004 American Vacuum Society

KEYWORDS and PACS

PACS

  • 42.79.Dj

    Gratings

  • 42.82.Cr

    Fabrication techniques; lithography, pattern transfer

  • 81.16.Nd

    Micro- and nanolithography

  • 85.40.Hp

    Lithography, masks and pattern transfer

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PUBLICATION DATA

ISSN

0734-211X (print)  

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