Doppler writing and linewidth control for scanning beam interference lithography

Montoya, Juan C.; Chang, Chih-Hao; Heilmann, Ralf K.; Schattenburg, Mark L.

doi:doi:10.1116/1.2127938

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Journal of Vacuum Science & Technology B / Volume 23 / Issue 6 / Papers from the 49th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication / Optical Lithography

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J. Vac. Sci. Technol. B 23, 2640 (2005); http://dx.doi.org/10.1116/1.2127938 (6 pages)

Doppler writing and linewidth control for scanning beam interference lithography

Juan C. Montoya, Chih-Hao Chang, Ralf K. Heilmann, and Mark L. Schattenburg

Space Nanotechnology Laboratory, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

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(Published online 1 December 2005)

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Scanning beam interference lithography (SBIL) is a technique which is used to create large-area periodic patterns with high phase accuracy. This is accomplished by combining interference lithography and an X-Y scanning stage. We previously reported parallel scan mode in which the stage scans in a direction parallel to the interference fringes. Here we present a method called Doppler scanning. In this mode, the stage is scanned perpendicular to the interference fringes. In order to obtain high-contrast latent gratings in the exposed photoresist, several parameters must be controlled. These parameters include vibration, fringe period error, time delay (for Doppler writing), dose, beam overlap, and polarization. In this article we present results of how the time delay, fringe period error, and exposure dose effect the contrast and linewidth of our latent grating images. Furthermore, SBIL has a unique ability to read gratings in a metrology mode configuration. This article also describes how Doppler metrology mode allows us to measure the time delay of our system.

ACKNOWLEDGMENTS

The authors gratefully acknowledge the assistance of Robert Fleming of the MIT Space Nanotechnology Laboratory and support from NASA Grant Nos. NAG5-12583 and NAG5-5405.

Article Outline

INTRODUCTION
DOPPLER WRITING
MEASURING THE TIME DELAY
LINEWIDTH CONTROL

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KEYWORDS and PACS

Keywords

Doppler broadening, diffraction gratings, photoresists, nanolithography

PACS

42.82.Cr

Fabrication techniques; lithography, pattern transfer
81.16.Nd

Micro- and nanolithography

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History

Received 5 July 2005
Accepted 25 September 2005
Published online 1 December 2005

Digital Object Identifier

http://dx.doi.org/10.1116/1.2127938

PUBLICATION DATA

ISSN

0734-211X (print)

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American Vacuum Society

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