Amino-propyl-triethoxy-silane on aluminum fiducial grids for spatial-phase-locked electron-beam lithography

Samantaray, C. B.; Hastings, J. T.

doi:doi:10.1116/1.3259960

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Journal of Vacuum Science & Technology B / Volume 27 / Issue 6 / LITHOGRAPHY / E-Beam Lithography

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J. Vac. Sci. Technol. B 27, 2558 (2009); http://dx.doi.org/10.1116/1.3259960 (5 pages)

Amino-propyl-triethoxy-silane on aluminum fiducial grids for spatial-phase-locked electron-beam lithography

C. B. Samantaray and J. T. Hastings

Department of Electrical and Computer Engineering, University of Kentucky, Lexington, Kentucky 40506-0046

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(Published online 1 December 2009)

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A new fiducial grid suitable for low-energy (1–5 keV) spatial-phase locked electron-beam lithography (SPLEBL) has been developed based on an aluminum layer with an organosilane grid pattern. The grids (400 nm period) were made of two to three layers of 3-amino-propyl-triethoxy-silane (APTES) that was microcontact printed onto Al coated polymethyl methacrylate (PMMA). Signal-to-noise ratios (SNRs) were measured at beam energies ranging from 1 to 5 keV at a dose of 20 μC/cm² and compared to the SNRs of octadecanethiol (ODT) based fiducial grids on Au, Ag, and Cu. Although fiducial grids made of ODT on Au provided excellent SNR, Au is not suitable because of poor penetration and strong scattering of the primary electrons. ODT based grids on lower atomic number metal such as Ag or Cu yielded inadequate SNRs. In contrast, APTES-based grids on Al provide SNRs approaching ODT on Au with greatly reduced electron scattering. The authors successfully developed a grid removal process that allows patterns to be resolved in the underlying PMMA. These results represent a key step in the development of low-energy SPLEBL.

ACKNOWLEDGMENTS

This material is based on work supported by the National Science Foundation under Grant No. CMMI-0609241. Electron-beam lithography and nanofabrication infrastructure was partially supported by NSF EPSCOR Award No. EPS-0447479. Experiments at the University of Kentucky were conducted within the Center for Nanoscale Science and Engineering (CeNSE). Brian Wajdyk and Chuck May provided valuable technical assistance.

Article Outline

INTRODUCTION
EXPERIMENT
RESULTS AND DISCUSSION
CONCLUSIONS

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KEYWORDS and PACS

Keywords

copper, electron beam lithography, gold, organic compounds, silver, soft lithography

PACS

85.40.Hp

Lithography, masks and pattern transfer
81.16.Nd

Micro- and nanolithography
81.05.Lg

Polymers and plastics; rubber; synthetic and natural fibers; organometallic and organic materials

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History

Received 22 July 2009
Accepted 15 October 2009
Published online 1 December 2009

Digital Object Identifier

http://dx.doi.org/10.1116/1.3259960

PUBLICATION DATA

ISSN

1071-1023 (print)

1520-8567 (online)

Publisher

American Vacuum Society

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