JVB Nameplate
  • Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

You are not logged in You are not logged in to this journal. Log In

Journal of Vacuum Science & Technology B / Volume 27 / Issue 6 / LITHOGRAPHY / Optical Lithography

J. Vac. Sci. Technol. B 27, 2958 (2009); http://dx.doi.org/10.1116/1.3245990 (4 pages)

Low-cost interference lithography

Corey P. Fucetola, Hasan Korre, and Karl K. Berggren

Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

View MapView Map

(Published online 3 December 2009)

Full Text: Read Online (HTML) | Download PDF | Rent Article | Buy PDF (US$28) | View Cart
The authors report demonstration of a low-cost ( ∼ 1000 USD) interference lithography system based on a Lloyd’s mirror interferometer that is capable of ∼ 300 nm pitch patterning. The components include only a 405 nm GaN diode-laser module, a machinist’s block, a chrome-coated silicon mirror, substrate, and double-sided carbon scanning electron microscopy (SEM) tape. The laser and the machinist’s block were assembled in a linear configuration, and to complete the system, the mirror and substrate were taped to perpendicular surfaces of the machinist’s block. Approximately 50 silicon substrates were prepared, exposed, and developed, after which some were inspected in a SEM. The associated laser spectrum was also measured, enabling calculation of the laser’s fringe visibility as it varied along the substrate surface. To compare the exposed resist pattern to the fringe visibility, the authors measured the first order diffraction efficiency as a function of position along the grating surface. Their measurements indicated that artifacts seen in both the optical spectrum and resulting grating patterns arose from the laser diode source, thus improving the source characteristics will be the topic of future work.

© 2009 American Vacuum Society

ACKNOWLEDGMENTS

The authors would like to acknowledge Tim Savas and Thomas O’Reilly for their helpful discussions about the diffraction grating artifacts, Jeremy Johnson for his help in measuring the optical spectrums, and Maria Csete for her help in setting the polarization of the interferometer. Funding for this project was provided by the Singapore-MIT Alliance.

Article Outline

  1. INTRODUCTION
  2. APPARATUS AND PROCEDURES
  3. RESULTS AND ANALYSIS
  4. DISCUSSION AND SUMMARY

RELATED ARTICLES

loading
View more related articles.

KEYWORDS and PACS

Keywords

nanolithography, nanopatterning, photolithography, scanning electron microscopy

PACS

  • 81.16.Nd

    Micro- and nanolithography

  • 81.16.Rf

    Micro- and nanoscale pattern formation

  • 85.40.Hp

    Lithography, masks and pattern transfer

RELATED DATABASES

To view database links for this article, you need to log in.
History
Received 2 July 2009
Accepted 14 September 2009
Published online 3 December 2009
Digital Object Identifier
http://dx.doi.org/10.1116/1.3245990

PUBLICATION DATA

ISSN

1071-1023 (print)  
1520-8567 (online)

Publisher

American Vacuum Society

For access to fully linked references, you need to log in.

For access to citing articles, you need to log in.


Figures (3)

Access to article objects (figures, tables, multimedia) requires a subscription; log in to view available files.
(Access to supplementary files, where available, is free for this journal.)


Close

Your Recent History Recent History Help

Recently Viewed

  1. Low-cost interference lithography
© 2013 AVS Science & Technology of Materials, Interfaces, and Processing Help | Contact
close