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J. Vac. Sci. Technol. B 28, 371 (2010); http://dx.doi.org/10.1116/1.3359608 (5 pages)

Two step optimized process for scanning tunneling microscopy tip fabrication

F. Bastiman1, A. G. Cullis1, M. Hopkinson1, and K. J. Briston2

1Department of Electronic and Electrical Engineering, University of Sheffield, Mappin Street, Sheffield S1 3JD, United Kingdom
2Department of Engineering Materials, University of Sheffield, Mappin Street, Sheffield S1 3JD, United Kingdom

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(Published online 23 March 2010)

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Fabrication of ultrasharp tips for scanning tunneling microscopy is inherently a two-step procedure, typically involving an etch process and postetch cleaning. From the myriad of etching parameters available in literature a procedure is presented that allows quantitative optimization and the routine production of tips with 3–10 nm radius of curvature. These ideally shaped tips require final oxide removal. Utilizing a custom designed e-beam heater element, oxide removal without localized melting is realized.

© 2010 American Vacuum Society

ACKNOWLEDGMENTS

The authors would like to thank Y. Peng for his expertise in tip cleaning methodologies, G. Hill for assistance with SEM imaging, and I. Lyne and H. Jenniches for assistance with the e-beam heater construction.

Article Outline

  1. INTRODUCTION
  2. EXPERIMENT
    1. Etching
    2. Cleaning
    3. STM
  3. RESULTS
    1. Etching types
    2. In situ annealing
    3. STM imaging
  4. DISCUSSION
  5. CONCLUSION

KEYWORDS and PACS

PACS

  • 68.37.Ef

    Scanning tunneling microscopy (including chemistry induced with STM)

  • 81.65.Cf

    Surface cleaning, etching, patterning

  • 07.79.Cz

    Scanning tunneling microscopes

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PUBLICATION DATA

ISSN

1071-1023 (print)  
1520-8567 (online)

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