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J. Vac. Sci. Technol. B 28, C2A94 (2010); http://dx.doi.org/10.1116/1.3271161 (4 pages)

Configuration-dependent enhancements of electric fields near the quadruple and the triple junction

M. S. Chung1, B.-G. Yoon1, P. H. Cutler2, N. M. Miskovsky2, B. L. Weiss2, and A. Mayer3

1Department of Physics, University of Ulsan, Ulsan 680-749, Korea
2Department of Physics, The Pennsylvania State University, University Park, Pennsylvania 16802
3Laboratoire de Physique du Solide, Facultes Universitaires Notre-Dame de la Paix, Rue de Bruxelles 61, B-5000 Namur, Belgium

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(Published online 1 April 2010)

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The authors investigated the behavior of an electric field near a junction composed of metal, dielectric, and vacuum. By using the two-dimensional model of the junction, the authors calculated the electric field near the junction as a function of configuration. For the triple junction of metal-vacuum-dielectric, the electric field is found to be enhanced and reduced according to the ratio of the contact angles. The use of the same model also leads to the result that the quadruple junction of metal-vacuum-dielectric-vacuum yields a much larger field enhancement than the triple junction. It is noted that the total enhancement of the electric field at the junction is the product of the two enhancements due to the dielectric and the shape of the metallic emission site.

© 2010 American Vacuum Society

ACKNOWLEDGMENT

This work was supported by the Korea Science and Engineering Foundation (KOSEF) grant funded by the Korea Government (MEST) (No. R01-2008-000-20025-0).

Article Outline

  1. INTRODUCTION
  2. SOLUTIONS OF THE LAPLACE EQUATION
  3. CALCULATIONS OF ELECTRIC FIELDS AND ENHANCEMENTS
  4. CONCLUSIONS

KEYWORDS and PACS

PACS

  • 77.22.Jp

    Dielectric breakdown and space-charge effects

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PUBLICATION DATA

ISSN

1071-1023 (print)  
1520-8567 (online)

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