Synthesis and electron emission properties of MgO nanowires

Tan, Huabing; Xu, Ningsheng; Deng, Shaozhi

doi:doi:10.1116/1.3275749

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Journal of Vacuum Science & Technology B / Volume 28 / Issue 2 / PAPERS FROM THE 22nd INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE / Materials

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J. Vac. Sci. Technol. B 28, C2B20 (2010); http://dx.doi.org/10.1116/1.3275749 (4 pages)

Synthesis and electron emission properties of MgO nanowires

Huabing Tan, Ningsheng Xu, and Shaozhi Deng

State Key Laboratory of Optoelectronic Materials and Technologies and Guangdong Province Key Laboratory for Display Materials and Technologies, School of Physics and Engineering, SunYat-Sen (Zhongshan) University, Guangzhou 510275, China

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(Published online 29 March 2010)

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Magnesium oxide film has high secondary electron emission yield and is found as applications in flat panel display widely. In this work, MgO nanowire electron emission properties, including both secondary and field emissions, are reported. MgO nanowire thin films have been synthesized on stainless steel substrate by thermal vapor deposition. The turn-on field of 9 MV/m for the field emission is measured with the MgO nanowire thin film, and the maximum secondary electron emission (SEE) yield of 8.3 is obtained. In addition, the good stability of SEE yield is also observed under long-time electron bombardment.

ACKNOWLEDGMENTS

The authors gratefully acknowledge the financial support of the project from the National Natural Science Foundation of China (Grant Nos. 50725206, U0634002, 50672135, and 60571035) and the Science and Technology Ministry of China (Grant Nos. 2003CB314701, 2007CB935501, and 2008AA03A314).

Article Outline

INTRODUCTION
EXPERIMENT
RESULTS AND DISCUSSION
CONCLUSION

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KEYWORDS and PACS

Keywords

electron-surface impact, field emission, insulating materials, magnesium compounds, nanofabrication, nanowires, secondary electron emission, vapour deposition

PACS

81.16.-c

Methods of micro- and nanofabrication and processing
79.20.Hx

Electron impact: secondary emission
81.15.-z

Methods of deposition of films and coatings; film growth and epitaxy
79.70.+q

Field emission, ionization, evaporation, and desorption

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History

Received 10 September 2009
Accepted 23 November 2008
Published online 29 March 2010

Digital Object Identifier

http://dx.doi.org/10.1116/1.3275749

PUBLICATION DATA

ISSN

1071-1023 (print)

1520-8567 (online)

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American Vacuum Society

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