Fabrication and electron field-emission properties of titanium oxide nanowire on glass substrate

Wakaya, F.; Miki, M.; Fukuyama, C.; Murakami, K.; Abo, S.; Takai, M.

doi:doi:10.1116/1.3368464

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Journal of Vacuum Science & Technology B / Volume 28 / Issue 2 / PAPERS FROM THE 22nd INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE / Materials

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J. Vac. Sci. Technol. B 28, C2B24 (2010); http://dx.doi.org/10.1116/1.3368464 (3 pages)

Fabrication and electron field-emission properties of titanium oxide nanowire on glass substrate

F. Wakaya, M. Miki, C. Fukuyama, K. Murakami, S. Abo, and M. Takai

Center for Quantum Science and Technology Under Extreme Conditions, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan

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(Published online 29 March 2010)

Abstract

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Titanium-oxide nanowires, whose diameter and length were in the order of 10 nm and 1 μm, respectively, were successfully fabricated directly on a glass substrate. The fabrication process adopted is very simple, in which the sputter-coated titanium film was immersed into NaOH solution at 80 °C and annealed at 500 °C in vacuum. Field-emission current from the titanium-oxide nanowires synthesized on a glass substrate was first observed, whose turn-on field was approximately 4 V/μm.

ACKNOWLEDGMENTS

This work was partially supported by the Grant-in-Aid for Scientific Research A (Grant No. 19206008) from the Ministry of Education, Culture, Sports, Science and Technology (MEXT) of Japan. One of the authors (K.M.) also acknowledges the support of Grant-in-Aid for Young Scientists B (Grant No. 20410108) from MEXT.

Article Outline

INTRODUCTION
EXPERIMENT
RESULTS AND DISCUSSION
CONCLUSION

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KEYWORDS and PACS

Keywords

annealing, electron field emission, nanofabrication, nanowires, semiconductor materials, semiconductor thin films, silicon compounds, sputtered coatings, titanium compounds, titanium oxide, glass, gold, NaOH

PACS

81.07.Gf

Nanowires
61.72.Cc

Kinetics of defect formation and annealing
68.55.ag

Semiconductors
81.15.Cd

Deposition by sputtering
81.16.-c

Methods of micro- and nanofabrication and processing
79.70.+q

Field emission, ionization, evaporation, and desorption

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History

Received 11 November 2009
Accepted 22 February 2010
Published online 29 March 2010

Digital Object Identifier

http://dx.doi.org/10.1116/1.3368464

PUBLICATION DATA

ISSN

1071-1023 (print)

1520-8567 (online)

Publisher

American Vacuum Society

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