Evaluation of emission uniformity of nanocrystalline silicon planar cathodes

Shimawaki, Hidetaka; Murakami, Katsuhisa; Neo, Yoichiro; Mimura, Hidenori; Wakaya, Fujio; Takai, Mikio

doi:doi:10.1116/1.3271165

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Journal of Vacuum Science & Technology B / Volume 28 / Issue 2 / PAPERS FROM THE 22nd INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE / Fabrication

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J. Vac. Sci. Technol. B 28, C2C49 (2010); http://dx.doi.org/10.1116/1.3271165 (4 pages)

Evaluation of emission uniformity of nanocrystalline silicon planar cathodes

Hidetaka Shimawaki¹, Katsuhisa Murakami², Yoichiro Neo³, Hidenori Mimura³, Fujio Wakaya², and Mikio Takai²

¹Graduate School of Engineering, Hachinohe Institute of Technology, 88-1 Ohbiraki, Myo, Hachinohe 031-8501, Japan
²Center for Quantum Science and Technology under Extreme Conditions, Osaka University, 1-3 Machikaneyama, Toyonaka, Osaka 560-8531, Japan
³Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan

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(Published online 1 April 2010)

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A planar-type cold cathode that has a thin film diode structure, such as a metal-oxide-semiconductor tunneling cathode, produces highly directional emission and is insensitive to environment in contrast with a field emission cathode. The authors fabricated the planar cathodes based on nanocrystalline silicon covered with a thin oxide film prepared by pulsed laser ablation and examined the emission uniformity. The electron emission from the cathode with thin gold metal occurred around the edge of the emission area where it was surrounded with contact metal of thick aluminum, while electrons were emitted near the center of the area in the cathode with thin platinum. Afterward, the electron emitted area extended to the whole emission area with increasing the gate voltage. Scanning electron microscopy images showed discontinuous island structures of gold film and continuous and dense of platinum. The results demonstrated that emission uniformity was strongly dependent on morphology and resistance of thin metal.

ACKNOWLEDGMENTS

A part of this work was carried out at the Laboratory for Nanoelectronics and Spintronics of the Research Institute of Electrical Communication, Tohoku University. This work was supported in part by a Grant-in-Aid for Scientific Research (C) from Japan Society for the Promotion of Science in Japan.

Article Outline

INTRODUCTION
EXPERIMENT
RESULTS AND DISCUSSION
CONCLUSION

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KEYWORDS and PACS

Keywords

cathodes, electron field emission, gold, laser ablation, metallic thin films, MIS structures, nanostructured materials, platinum, scanning electron microscopy, silicon, Material names: MOS cathode, nanocrystalline Si, tunneling emission, field emission, vacuum nanoelectronics

PACS

79.70.+q

Field emission, ionization, evaporation, and desorption
79.20.Eb

Laser ablation
81.07.Bc

Nanocrystalline materials
62.23.-c

Structural classes of nanoscale systems
82.45.Fk

Electrodes

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History

Received 15 September 2009
Accepted 19 October 2009
Published online 1 April 2010

Digital Object Identifier

http://dx.doi.org/10.1116/1.3271165

PUBLICATION DATA

ISSN

1071-1023 (print)

1520-8567 (online)

Publisher

American Vacuum Society

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