High performance of compact radical monitoring probe in H2/N2 mixture plasma

Moon, Chang Sung; Takeda, Keigo; Takashima, Seigo; Sekine, Makoto; Setsuhara, Yuichi; Shiratani, Masaharu; Hori, Masaru

doi:doi:10.1116/1.3327926

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Journal of Vacuum Science & Technology B / Volume 28 / Issue 2 / Letters

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J. Vac. Sci. Technol. B 28, L17 (2010); http://dx.doi.org/10.1116/1.3327926 (4 pages)

High performance of compact radical monitoring probe in H₂/N₂ mixture plasma

Chang Sung Moon¹, Keigo Takeda¹, Seigo Takashima², Makoto Sekine³, Yuichi Setsuhara⁴, Masaharu Shiratani⁵, and Masaru Hori³

¹Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 463-8603, Japan
²Plasma Center for Industrial Applications, Nagoya Urban Industries Promotion Corporation, Nagoya 463-0003, Japan
³Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 463-8603, Japan and Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan
⁴Joining and Welding Research Institute, Osaka University, Ibaraki, Osaka 567-0047, Japan and Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan
⁵Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 812-8581, Japan and Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan

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(Published online 24 March 2010)

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The authors have developed a compact monitoring probe for measuring the spatial distribution of the atomic radical densities of hydrogen and nitrogen, employing a vacuum ultraviolet absorption spectroscopy with a high pressure microdischarge hollow cathode lamp as a light source. In order to achieve the high performance of measuring the spatial distribution of atomic radical densities, they have tried to realize spatially nonuniform plasma discharge by parallel plates with respective different sizes. It was confirmed that the compact radical monitoring probe enabled one to measure the spatial distribution of atomic radical densities in the plasma precisely. In addition, the etching characteristics of a low-k film were analyzed in H₂/N₂ mixture plasma by internal parameters such as radical and ion fluxes coming to the substrate.

ACKNOWLEDGMENT

The authors are grateful for the financial support provided by Core Research for Evolutional Science and Technology (CREST) of the Japan Science and Technology Agency (JST).

Article Outline

INTRODUCTION
EXPERIMENT
RESULTS AND DISCUSSION
CONCLUSION

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KEYWORDS and PACS

Keywords

discharge lamps, plasma diagnostics

PACS

52.70.-m

Plasma diagnostic techniques and instrumentation
42.72.-g

Optical sources and standards
84.47.+w

Vacuum tubes

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History

Received 21 September 2009
Accepted 26 January 2010
Published online 24 March 2010

Digital Object Identifier

http://dx.doi.org/10.1116/1.3327926

PUBLICATION DATA

ISSN

1071-1023 (print)

1520-8567 (online)

Publisher

American Vacuum Society

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