In situ direct visualization of irradiated electron-beam patterns on unprocessed resists using atomic force microscopy

Koop, H.; Zech, M.; Karrai, K.; Schnurbusch, D.; Müller, M.; Gründl, T.; Amann, M.-C.; Holleitner, A. W.

doi:doi:10.1116/1.3457938

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Journal of Vacuum Science & Technology B / Volume 28 / Issue 4 / Regular Articles

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J. Vac. Sci. Technol. B 28, 802 (2010); http://dx.doi.org/10.1116/1.3457938 (4 pages)

In situ direct visualization of irradiated electron-beam patterns on unprocessed resists using atomic force microscopy

H. Koop¹, M. Zech¹, K. Karrai¹, D. Schnurbusch², M. Müller², T. Gründl², M.-C. Amann², and A. W. Holleitner²

¹Attocube Systems AG, Koeniginstrasse 11a RGB, 80539 Munich, Germany
²Walter Schottky Institut and Physik-Department, Technische Universität München, Am Coulombwall, D-85748 Garching, Germany

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(Published online 12 July 2010)

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The authors introduce an in situ characterization method of resists used for electron-beam lithography. The technique is based on the application of an atomic force microscope, which is directly mounted below the cathode of an electron-beam lithography system. They demonstrate that patterns irradiated by the electron beam can be efficiently visualized and analyzed in surface topography directly after the electron-beam exposure. This in situ analysis takes place without any development or baking steps and gives access to the chemical (or latent) image of the irradiated resist.

ACKNOWLEDGMENTS

The authors thank P. Weiser for great technical help. Furthermore, they gratefully acknowledge financial support by the DFG (Grant No. Ho 3324/4), the German excellence initiative via the “Nanosystems Initiative Munich (NIM)” as well as the “Center for NanoScience” (CeNS) in Munich.

Article Outline

INTRODUCTION
EXPERIMENT
RESULTS AND DISCUSSION
CONCLUSION

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KEYWORDS and PACS

Keywords

atomic force microscopy, electron beam lithography, resists, surface topography, polymethylmethacrylate, silicon, silicon dioxide

PACS

85.40.Hp

Lithography, masks and pattern transfer
42.82.Cr

Fabrication techniques; lithography, pattern transfer
68.37.Ps

Atomic force microscopy (AFM)

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History

Received 23 March 2010
Accepted 7 June 2010
Published online 12 July 2010

Digital Object Identifier

http://dx.doi.org/10.1116/1.3457938

PUBLICATION DATA

ISSN

1071-1023 (print)

1520-8567 (online)

Publisher

American Vacuum Society

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