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Journal of Vacuum Science & Technology B / Volume 28 / Issue 6 / PAPERS FROM THE 54th INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION / Novel Imaging-Optical Lithography

J. Vac. Sci. Technol. B 28, C6Q20 (2010); http://dx.doi.org/10.1116/1.3504498 (5 pages)

Development of a simple, compact, low-cost interference lithography system

Hasan Korre1, Corey P. Fucetola1, Jeremy A. Johnson2, and Karl K. Berggren1

1Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
2Department of Chemistry, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

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(Published online 2 December 2010)

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Interference lithography (IL) has proven itself to be an enabling technology for nanofabrication. Within IL, issues of spatial phase distortion, fringe stability, and substrate development have been explored and addressed. However, IL tools are still unnecessarily expensive, large, and complex. To address these issues, the authors previously built a simple IL tool that used a blue laser diode to produce ∼ 300 nm pitch structures. The resulting patterned areas ( ∼ mm2) were limited by both the temporal and spatial coherence of the laser. Here, the authors report on the advancement of their low-cost interference lithography tool that makes use of newly available blue laser diodes and a simplified spatial filter to print larger-area ( ∼ cm2) patterns. With this configuration, the authors have designed and implemented a small-footprint ( ∼ 0.2 m2) Lloyd’s mirror IL tool that can be assembled for less than ∼ 6000 USD.

© 2010 American Vacuum Society

ACKNOWLEDGMENTS

The authors would like to acknowledge the contributions of Tim Savas for discussions of laser diodes, Jim Daley for clean room and SEM assistance, and Tom O’Reilly for discussions of spatial filtering. Funding for this project was provided by the Singapore-MIT Alliance and the Air Force Office of Scientific Research under Grant No. FA9550-08-1-0379.

Article Outline

  1. INTRODUCTION
  2. TOOL DESIGN
  3. PROCEDURES
  4. RESULTS
  5. DISCUSSION AND SUMMARY

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KEYWORDS and PACS

Keywords

laser beams, laser feedback, mirrors, nanofabrication, nanolithography, nanopatterning, optical filters, photolithography, soft lithography, spatial filters, PFI-88 photoresist, Barli anti-reflection coating, CD- (tetramethylammonium hydroxide) developer

PACS

  • 81.16.Nd

    Micro- and nanolithography

  • 85.40.Hp

    Lithography, masks and pattern transfer

  • 81.16.Rf

    Micro- and nanoscale pattern formation

  • 42.79.Ci

    Filters, zone plates, and polarizers

  • 42.60.Jf

    Beam characteristics: profile, intensity, and power; spatial pattern formation

  • 42.82.Cr

    Fabrication techniques; lithography, pattern transfer

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History
Received 12 July 2010
Accepted 27 September 2010
Published online 2 December 2010
Digital Object Identifier
http://dx.doi.org/10.1116/1.3504498

PUBLICATION DATA

ISSN

1071-1023 (print)  
1520-8567 (online)

Publisher

American Vacuum Society

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