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Journal of Vacuum Science & Technology B / Volume 29 / Issue 6 / The 55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication / Maskless Lithography

J. Vac. Sci. Technol. B 29, 06FD03 (2011); http://dx.doi.org/10.1116/1.3662396 (6 pages)

Multitip atomic force microscope lithography system for high throughput nanopatterning

Young Oh1, Chulmin Choi1, Kunbae Noh1, Diana Villwock1, Sungho Jin1, Gwangmin Kwon2, and Haiwon Lee2

1Materials Science & Engineering, University of California at San Diego, La Jolla, California 92093
2Department of Chemistry, Hanyang University, Seoul, Korea 133-791

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(Published online 22 November 2011)

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An atomic force microscope (AFM) system with multiple parallel lithography probes of equal heights on a single cantilever was created in order to improve the throughput of AFM lithography. The multitip probe was fabricated by electron-beam (e-beam) lithography and a dry silicon etching process. Several carbon islands were made on a single cantilever in a straight line by e-beam lithography and were used as an etch mask, whereas the silicon pedestal structure of the multitip probe was fabricated by reactive ion etching (RIE). Finally the carbon islands were sharpened by a RIE process using oxygen gas. The multitip probe was successfully applied to form multidot pattern arrays on a negative resist film coated on silicon by low electric field induced AFM lithography. A pedestal nanopillar structure was utilized as a convenient support feature that enabled better control of multiple nanotip arrays for AFM writing. The authors fabricated such a nanopedestal array with extremely sharp nanoneedle tips.

© 2011 American Vacuum Society

ACKNOWLEDGMENTS

The authors acknowledge the financial support of this work by NSF-Nanomanufacturing Division (CMMI No. 0856674), CMRR (Center for Magnetic Recording Research) at UC San Diego, a National Research Foundation (NRF) grant through the World Class University Program (R33-2008-000-10025-0), CNMT Grant Frontier R&D Program, and the National Program for Tera-Level Nanodevices in the framework of the of the 21 Century Frontier programs from the Ministry of Education, Science and Technology of South Korea.

Article Outline

  1. INTRODUCTION
  2. EXPERIMENTAL METHODS
    1. Multitip probes fabrication
    2. Material preparation
    3. AFM lithographic process
  3. RESULTS AND DISCUSSION
  4. CONCLUSIONS

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KEYWORDS and PACS

Keywords

atomic force microscopy, cantilevers, carbon, electron resists, island structure, masks, nanolithography, nanopatterning, silicon, sputter etching

PACS

  • 81.05.U-

    Carbon/carbon-based materials

  • 52.77.Bn

    Etching and cleaning

  • 81.16.Nd

    Micro- and nanolithography

  • 81.16.Rf

    Micro- and nanoscale pattern formation

  • 81.65.Cf

    Surface cleaning, etching, patterning

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History
Received 28 June 2011
Accepted 24 October 2011
Published online 22 November 2011
Digital Object Identifier
http://dx.doi.org/10.1116/1.3662396

PUBLICATION DATA

ISSN

1071-1023 (print)  
1520-8567 (online)

Publisher

American Vacuum Society

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