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J. Vac. Sci. Technol. B 30, 020601 (2012); http://dx.doi.org/10.1116/1.3678490 (4 pages)

Low resistance and thermally stable Ti/Al-based Ohmic contacts to N-face n-GaN for vertical light-emitting diodes by using Ti(Ga) solid solution and TiN layers

Joon-Woo Jeon1, Woong-Sun Yum1, Tae-Yeon Seong1, Sang Youl Lee2, and June-O Song2

1Department of Materials Science and Engineering, Korea University, Seoul 136-713, Korea
2Department of LED Business, Chip Development Group, LG Innotek, Gwangju 506-251, Korea

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(Published online 24 January 2012)

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The authors report on the formation of highly reliable Ti/Al-based ohmic contacts to N-face n-GaN for high-performance vertical light-emitting diodes by using Ti(Ga) solid solution and TiN layers. The Ti(Ga) solid solution layer is used to minimize the outdiffusion of Ga atoms from the n-GaN surface region. Unlike the Ti/Al contacts, the Ti(Ga)/Ti/Al and Ti(Ga)/TiN/Al samples exhibit ohmic behavior with contact resistivities of 3.9 – 4.8 × 10−4 Ωcm2 after annealing at 250 °C. It was further shown that unlike the Ti(Ga)/TiN/Al samples, the Ti/Al and the Ti(Ga)/Ti/Al samples are largely electrically degraded when annealed at 300 °C in an oven. Based on x-ray photoemission spectroscopy and secondary ion mass spectrometry results, ohmic formation and degradation mechanisms are briefly described and discussed.

© 2012 American Vacuum Society

ACKNOWLEDGMENTS

This work was supported by the World Class University program through the National Research Foundation of Korea funded by the Ministry of Education, Science, and Technology (MEST) (Grant No. R33-2008-000-10025-0), and the Industrial Technology Development Program funded by the Ministry of Knowledge Economy (MKE), Korea.

Article Outline

  1. INTRODUCTION
  2. EXPERIMENT
  3. RESULTS AND DISCUSSION
  4. SUMMARY AND CONCLUSIONS

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PUBLICATION DATA

ISSN

1071-1023 (print)  
1520-8567 (online)

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