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J. Vac. Sci. Technol. B 30, 02B120 (2012); http://dx.doi.org/10.1116/1.3679547 (4 pages)

Shallow defect states in GaAs responsible for GaAs bandgap upconversion induced by electron beam during MBE growth

David M. Tex and Itaru Kamiya

Toyota Technological Institute, 2-12-1 Hisakata, Tempaku, Nagoya 468-8511, Japan

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(Published online 1 February 2012)

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Upconversion through excitation of bulk GaAs is investigated by change in crystal growth conditions with electron beam (e-beam). The upconverted photoluminescence intensity is enhanced several times by striking the source fluxes with e-beam during molecular beam epitaxy (MBE) growth. Experimental evidence for a shallow intermediate state being responsible for this upconversion is presented. It is suggested that the intermediate state may be formed by shallow exciton trap states induced by As anti-site defects, which can be increased with e-beam during MBE growth.

© 2012 American Vacuum Society

ACKNOWLEDGMENTS

This work was supported by the Strategic Research Infrastructure Project, the Ministry of Education, Sports, Science and Technology, Japan.

Article Outline

  1. INTRODUCTION
  2. EXPERIMENT
  3. RESULTS AND DISCUSSION
  4. CONCLUSION

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1071-1023 (print)  
1520-8567 (online)

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