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Dec 2007

Volume 14, Issue 1, pp. 1-102

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Surf. Sci. Spectra 14, 34 (2007); http://dx.doi.org/10.1116/11.20080401 (7 pages)

Davide Barreca, Andrian Milanov, Roland A. Fischer, Anjana Devi, and Eugenio Tondello
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Ultra-thin Titanium Oxide Films on Mo(112), Measured by XPS

Dheeraj Kumar, Ming Shu Chen, and David W. Goodman

Surf. Sci. Spectra 14, 1 (2007); http://dx.doi.org/10.1116/11.20050801 (7 pages)

Online Publication Date: 28 December 2007

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Two preparation methods were employed to grow a well-ordered ultra-thin titanium oxide film on Mo(112). The first method consisted of growing the films by direct deposition of Ti by chemical vapor deposition, followed by oxidation. Better film quality was obtained by the second method which involved deposition of Ti onto monolayer SiO2/Mo(112), as described in our prior work. By using x-ray photoelectron spectroscopy, Ti was determined to be in +3 oxidation state. © 2008 American Vacuum Society.
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81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)
79.60.Dp Adsorbed layers and thin films

Effect of the Preparation Procedure on the Surface Properties of Nanosized Ceria Powders

Marta Maria Natile, Alessandro Galenda, and Antonella Glisenti

Surf. Sci. Spectra 14, 8 (2007); http://dx.doi.org/10.1116/11.20061004 (11 pages)

Online Publication Date: 28 January 2008

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Nanosized cerium (IV) oxide powders were synthesized using three different preparation procedures: (1) precipitation from a basic solution of cerium nitrate containing H2O2 at 273 K; (2) Marcilly method, and (3) microemulsion method. In this work the influence of the preparation procedure on the surface properties is studied by means of XPS. Besides the wide scan spectrum, detailed spectra for the Ce 3d, Ce 4d, O and 1s and regions and relative data are presented and discussed. © 2008 American Vacuum Society.
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81.20.Ev Powder processing: powder metallurgy, compaction, sintering, mechanical alloying, and granulation
81.10.Dn Growth from solutions
81.10.Fq Growth from melts; zone melting and refining
81.15.Lm Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)
79.60.Ht Disordered structures

ZnO Nanoplatelets Obtained by Chemical Vapor Deposition, Studied by XPS

Davide Barreca, Alberto Gasparotto, Chiara Maccato, Cinzia Maragno, and Eugenio Tondello

Surf. Sci. Spectra 14, 19 (2007); http://dx.doi.org/10.1116/11.20071001 (8 pages) | Cited 9 times

Online Publication Date: 6 March 2009

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Zinc oxide nanoplatelets have been successfully grown on Si(l00) by a catalyst-free Chemical Vapor Deposition (CVD) route starting from a second-generation Zn(II) molecular precursor, Zn(hfa)2⋅TMEDA (Hhfa=1,1,1,5,5,5-hexafluoro-2,4-pentanedione; TMEDA=N,N,N',N'- tetramethylethylenediamine). The syntheses were performed under a nitrogen+wet oxygen atmosphere and the best results were obtained at deposition temperatures of 350 and 400 °C. The obtained samples were thoroughly characterized by several techniques, namely Glancing-Incidence X-ray Diffraction (GIXRD), Atomic Force Microscopy (AFM), Field Emission-Scanning Electron Microscopy (FE-SEM), Energy Dispersive X-ray Spectroscopy (EDXS), X-ray Photoelectron (XPS) and X-ray Excited Auger Electron (XE-AES) Spectroscopies. Finally, the photocatalytic performances of ZnO nanoplatelets in the decomposition of the azo-dye Orange II were also evaluated. The present contribution is specifically dedicated to the XPS and XE-AES characterization of a representative ZnO nanoplatelet sample deposited at 350 °C. Beside the wide scan spectrum, detailed spectra for the Zn 2p3/2, Zn 3p, Zn LMM, O 1s, and C 1s are also presented. The obtained results evidenced the formation of pure zinc oxide systems under the adopted synthetic conditions.
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81.07.Bc Nanocrystalline materials
81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)
79.60.Jv Interfaces; heterostructures; nanostructures
82.65.+r Surface and interface chemistry; heterogeneous catalysis at surfaces
82.50.-m Photochemistry

TiO2 Thin Films by Chemical Vapor Deposition: An XPS Characterization

Davide Barreca, Alberto Gasparotto, Chiara Maccato, Cinzia Maragno, and Eugenio Tondello

Surf. Sci. Spectra 14, 27 (2007); http://dx.doi.org/10.1116/11.20070902 (7 pages) | Cited 3 times

Online Publication Date: 23 March 2009

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As a part of a comprehensive research work on ZnO-TiO2 nanosystems synthesized by Chemical Vapor Deposition (CVD), we initially devoted our attention to the preparation and characterization of nanocrystalline TiO2 thin films. Specifically, the coatings were obtained by CVD on Si(100) substrates starting from Ti(OiPr)2(dpm)2 (OiPr=iso-propoxy; dpm=2,2,6,6-tetramethyl-3,5-heptanedionate), under a dry O2 atmosphere. The obtained samples were characterized by complementary techniques, namely Glancing Incidence X-ray Diffraction (GIXRD), X-ray Photoelectron Spectroscopy (XPS) and Scanning Electron Microscopy (SEM), for a thorough investigation of their microstructure, chemical composition and morphology. The present contribution is devoted to the XPS analysis of a TiO2 thin film obtained at 450 °C. Besides the wide scan spectrum, detailed spectra for the Ti 2p, O ls and C 1s regions and related data are presented and discussed.
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81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)
82.80.Pv Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.)
68.55.A- Nucleation and growth

Hafnium oxide thin film grown by ALD: An XPS study

Davide Barreca, Andrian Milanov, Roland A. Fischer, Anjana Devi, and Eugenio Tondello

Surf. Sci. Spectra 14, 34 (2007); http://dx.doi.org/10.1116/11.20080401 (7 pages) | Cited 8 times

Online Publication Date: 15 June 2009

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Hafnium(IV) oxide thin films were synthesized by atomic layer deposition (ALD) on Si(100) substrates, using an innovative guanidinate-stabilized hafnium amide precursor, [Hf(NEtMe)2(EtMeNC(NiPr)2)2]. In the present work, our attention is focused on a detailed XPS characterization of a representative HfO2 coating grown at 350 °C. Beside the wide scan spectrum, detailed spectra for the O 1s, Hf 4f, Hf 4d and C 1s regions and related data are presented and discussed. The obtained results point out to the formation of HfO2 coatings characterized by the presence of -OH groups, whose main origin is attributed to the use of water as oxidizing agent during the preparation process.
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81.05.-t Specific materials: fabrication, treatment, testing, and analysis
77.55.-g Dielectric thin films
81.15.-z Methods of deposition of films and coatings; film growth and epitaxy
79.60.Bm Clean metal, semiconductor, and insulator surfaces
82.80.Pv Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.)

CVD Cu2O and CuO Nanosystems Characterized by XPS

Davide Barreca, Alberto Gasparotto, and Eugenio Tondello

Surf. Sci. Spectra 14, 41 (2007); http://dx.doi.org/10.1116/11.20080701 (11 pages) | Cited 6 times

Online Publication Date: 22 July 2009

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In the present investigation, X-ray photoelectron and X-ray excited Auger electron spectroscopy analyses of the principal core levels (O 1s, Cu 2p, and Cu LMM) of Cu2O and CuO nanosystems are proposed. The samples were obtained by chemical vapor deposition starting from a novel second-generation copper(II) precursor, Cu(hfa)2⋅TMEDA (hfa=1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA=N,N,N’,N’- tetramethylethylenediamine), under a dry O2 atmosphere. The obtained route led to pure, homogeneous and single-phase Cu(I) and Cu(II) oxide nanosystems at temperatures of 300 and 500 °C, respectively, whose chemical nature could be conveniently distinguished by analyzing the Cu 2p band shape and position, as well as by evaluating the Auger parameters. The samples were characterized by O/Cu atomic ratios greater than the expected stoichiometric values, due to marked interactions with the outer atmosphere attributed to their high surface-to-volume ratio.
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81.16.-c Methods of micro- and nanofabrication and processing
81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)
79.60.Jv Interfaces; heterostructures; nanostructures
61.46.-w Structure of nanoscale materials
73.22.-f Electronic structure of nanoscale materials and related systems
61.66.Bi Elemental solids
61.66.Dk Alloys

Nanostructured Dy2O3 films: An XPS Investigation

Davide Barreca, Alberto Gasparotto, Andrian Milanov, Eugenio Tondello, Anjana Devi, and Roland A. Fischer

Surf. Sci. Spectra 14, 52 (2007); http://dx.doi.org/10.1116/11.20080702 (8 pages) | Cited 1 time

Online Publication Date: 23 July 2009

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The present investigation is devoted to the X-ray photoelectron spectroscopy (XPS) analysis of the main core levels (C 1s, O 1s, Dy 4d, Dy 3d) of a representative dysprosium(III) oxide thin film. The specimen was grown on Si(100) at 500 °C by metal organic chemical vapor deposition (MOCVD) starting from Dy((iPrN)2CNMe2)3 in an N2/O2 atmosphere. The above route yielded uniform and homogeneous nanostructured Dy2O3 films characterized by a remarkable reactivity towards atmospheric CO2 and H2O, resulting in the surface co-presence of dysprosium carbonates/bicarbonates and hydroxides. The most relevant spectral features are presented and discussed.
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79.60.Jv Interfaces; heterostructures; nanostructures
81.15.-z Methods of deposition of films and coatings; film growth and epitaxy
77.55.-g Dielectric thin films
81.07.Bc Nanocrystalline materials
81.16.-c Methods of micro- and nanofabrication and processing
81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)

Gd2O3 Nanostructured Thin Films Analyzed by XPS

Davide Barreca, Alberto Gasparotto, Andrian Milanov, Eugenio Tondello, Anjana Devi, and Roland A. Fischer

Surf. Sci. Spectra 14, 60 (2007); http://dx.doi.org/10.1116/11.20080703 (8 pages) | Cited 1 time

Online Publication Date: 24 July 2009

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The present work was devoted to the X-ray photoelectron spectroscopy (XPS) investigation of the principal core levels of a nanostructured Gd2O3 thin film. The sample was synthesized by metal organic chemical vapor deposition (MOCVD) from Gd((iPrN)2CNMe2)3 as precursor at 500 °C in an N2/O2 atmosphere. XPS results evidenced a marked Gd2O3 reactivity towards atmospheric CO2 and H2O, leading to a surface composition characterized by the co-presence of gadolinium carbonates/bicarbonates and hydroxides.
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73.61.At Metal and metallic alloys
82.80.Pv Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.)
77.55.-g Dielectric thin films
81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)

ZnxNi1-xO Mixed-Metal Oxides by AES

Karen J. Gaskell, Anne Starace, and Marjorie A. Langell

Surf. Sci. Spectra 14, 68 (2007); http://dx.doi.org/10.1116/11.20071201 (11 pages)

Online Publication Date: 2 April 2010

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ZnxNi1-xO samples with a compositional range 0 < × ≤ 0.3 were synthesized via thermal dissolution in air and their surface characterized with Auger electron spectroscopy (AES). AES analysis shows the surface composition to be comparable to the bulk composition. These systems are interesting as they place zinc in an octahedral environment which is unusual for zinc normally preferring a tetrahedral environment. This submission contains survey spectra for the homogeneous solid solutions, Zn0.05Ni0.95O, Zn0.1Ni0.9O, Zn0.2Ni0.8O, Zn0.3Ni0.7O and for pure NiO and ZnO. All samples have the rocksalt crystal structure except ZnO which has the Wurtzite crystal structure.
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79.20.Fv Electron impact: Auger emission
68.35.Dv Composition, segregation; defects and impurities
61.66.Fn Inorganic compounds
81.20.-n Methods of materials synthesis and materials processing

ZnxNi1-xO Mixed-Metal Oxides by XPS and Auger

Karen J. Gaskell, Anne Starace, and Marjorie A. Langell

Surf. Sci. Spectra 14, 79 (2007); http://dx.doi.org/10.1116/11.20071202 (24 pages)

Online Publication Date: 5 May 2010

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Show Abstract
ZnxNi1-xO samples with a compositional range 0 < × ≤ 0.3 were synthesized via thermal dissolution in air and their surface characterized with x-ray photoelectron spectroscopy (XPS). XPS analysis shows the surface composition to be comparable to the bulk composition. These systems are interesting as they place zinc in an octahedral environment which is unusual for zinc normally preferring a tetrahedral environment. Auger parameter analysis further illustrates this unusual environment yielding a zinc Auger parameter equal to ∼2011 eV, more than 1 eV greater than found for zinc oxide in the wurtzite form, also in the +2 oxidation state. This submission contains the core level and survey spectra for the homogeneous solid solutions, Zn0.05Ni0.95O, Zn0.1Ni0.9O, Zn0.2Ni0.8O, Zn0.3Ni0.7O and for pure NiO and ZnO. All samples have the rocksalt crystal structure except ZnO which has the wurtzite crystal structure.
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79.60.-i Photoemission and photoelectron spectra
82.80.Pv Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.)
81.40.Gh Other heat and thermomechanical treatments
61.66.-f Structure of specific crystalline solids
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