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Surface Science Spectra / Volume 17 / Issue 1

Surf. Sci. Spectra 17, 87 (2010); http://dx.doi.org/10.1116/11.20071103 (6 pages)

Gas Phase Deposition of Trichloro(1H,1H,2H,2H-perfluorooctyl)silane on Silicon Dioxide, by XPS

Michael V. Lee1, Ghaleb Husseini2, Ken Sautter3, and Matthew R. Linford1

1Brigham Young University, Provo, Utah
2American University of Sharjah, Chemical Engineering, Sharjah, United Arab Emirates
3Yield Engineering Systems, California

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(Published online 7 February 2012)

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Monolayers of trichloro(lH,1H,2H,2H-perfluorooctyl)silane, Cl3SiCH2CH2(CF2)5CF3, were deposited via chemical vapor deposition onto the native oxide layer on silicon after plasma-cleaning. The samples have high hydrophobicity, and provide a valuable comparison to perfluorinated alkyl silane layers obtained by liquid deposition. Gas-phase deposition of perfluorinated alkyl silanes is a useful means for reducing stiction in micro- and nano-electromechanical systems, which have narrow spaces that can trap bubbles and prevent liquid-based silane passivation.

© 2010 American Vacuum Society

ACKNOWLEDGMENTS

The authors thank Loren Rieth for his assistance in operating the Kratos instrument and in accurately reporting the instrument's characteristics.

Article Outline

  1. SPECIMEN DESCRIPTION (Accession #01199)
  2. INSTRUMENT DESCRIPTION
  3. INSTRUMENT PARAMETERS COMMON TO ALL SPECTRA
    1. Spectrometer
    2. Geometry
  4. DATA ANALYSIS METHOD

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KEYWORDS and PACS

Keywords

chemical vapour deposition, contact angle, hydrophobicity, monolayers, plasma materials processing, polymers, X-ray photoelectron spectra, perfluorinated silane, gas-phase, native silicon dioxide

PACS

  • 81.05.Lg

    Polymers and plastics; rubber; synthetic and natural fibers; organometallic and organic materials

  • 81.15.Gh

    Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)

  • 82.80.Pv

    Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.)

  • 52.77.Bn

    Etching and cleaning

  • 68.03.Cd

    Surface tension and related phenomena

  • 79.60.Fr

    Polymers; organic compounds

History
Received 20 November 2007
Accepted 17 December 2008
Published online 7 February 2012
Digital Object Identifier
http://dx.doi.org/10.1116/11.20071103

PUBLICATION DATA

ISSN

1055-5269 (print)  
1520-8575 (online)

Publisher

American Vacuum Society

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